Weifang Xingtaike Microelectronic Materials Co., Ltd. was founded in 2010. The company has been committed to the research and development, production and sales of photoresist for many years.
The company has established a first-class technical research and development team, with advanced and complete product research and development equipment and methods. The company’s main products are sapphire substrate (PSS) special photoresist, lift-off photoresist, flexible photoresist, nano-imprint photoresist, SU-8 thick photoresist and other high-end photoresists. And supporting reagents, widely used in LED, LCD, IC, MEMS, packaging and other fields. The company's products have all independent intellectual property rights, and some of the product technical indicators have reached the domestic leading level. The photoresist put on the domestic market partially replaced foreign imported products. The black photoresist and 248-nanometer photoresist independently developed by the company have passed the tests of domestic authoritative institutions, and the technical indicators have reached or exceeded the domestic leading level, and have the technical conditions for industrialized production.

The company adheres to the business tenet of "seeking development by technology and seeking benefits from the market", continuously improving the company's research and development capabilities and service levels, providing more customers with high-quality products and perfect technical services, and doing everything possible for the development of my country's semiconductor materials industry. can.